Application of RAS-POINT MODE in the Depth Profile of Si/Mo Multilayer Film Material

A Si/Mo noncrystalline multilayer film sample was cut into two equal pieces in surface area for two times SIMS depth profile analysis by using RAS POINT MODE and POINT MODE respectively. The results obtained by RAS POINT MODE,which is a kind of RAS MODE in combination with POINT MODE, form a striking contrast to POINT MODE and show that RAS POINT MODE overcome the "Crater effects" efficiently.